It is composed of a vacuum system, a winding system, a magnetron target sputtering system, a control system, etc., and can achieve copper, lead, aluminum, tin, silver, etc. sputtering on thin films ranging from 2 μm to 300 μm thick.
Magnetron sputtering is composed of a vacuum system, a winding system, a magnetron target sputtering system, a control system, etc., and can achieve copper, lead, aluminum, tin, silver, etc. sputtering on thin films with a thickness of 2 μm to 300 μm. Can be accurately coated on the surface of various coils such as film, cloth, sponge, copper foil, paper, etc.
Magnetron sputtering can be said to be one of the great achievements in coating technology. It has the advantages of high sputtering rate, low substrate temperature rise, good film substrate bonding force, stable performance, convenient operation and control, etc. It uses physical vapor deposition to achieve sputtering and ion plating (hollow cathode ion plating, hot cathode ion plating, arc ion plating, reactive ion plating, radio frequency ion plating, and DC discharge ion plating).
The working principle of magnetron sputtering is that electrons collide with argon atoms in the process of flying to the substrate under the action of the electric field e, generating ar positive ions and new electrons; new electrons fly to the substrate, and the ar positive ions are under the action of the electric field Accelerate to fly to the cathode target. Bombing the target surface causes the target to sputter. In the sputtered particles, neutral target atoms or molecules are deposited on the substrate to form a thin film. The secondary electrons generated are affected by the electric and magnetic fields, resulting in a direction shift of e (electric field) × b (magnetic field), referred to as exb drift. Its motion trajectory is similar to a cycloid.
The magnetron winding series coating equipment is mainly used in higher-grade packaging, decoration, touch screen, field-effect lighting, radiation protection, heat insulation and frost prevention. The characteristics of the equipment are that the base material is neatly rolled, no scratches, high target utilization, uniform gas discharge from the inflation system, reasonable structure, stable performance, and convenient operation. ITO film, capacitor film, etc. can be plated with the magnetron winding series coating equipment. With the continuous development of coating technology, it will be more commonly used in other fields.