The use of vacuum coating machine is a large branch in the use of vacuum systems, and has a wide range of uses in many aspects such as optics, electronics, physical and chemical instruments, packaging, machinery and appearance processing skills. Here are some of the methods it uses.
The use of vacuum coating machine is simply understood in the vacuum environment, using metallization, sputtering, and subsequent condensation methods, metal, glass, ceramics, semiconductors and plastic parts and other objects are plated with a metal film or cover layer. Compared with the traditional coating method, the use of vacuum coating is classified as a dry coating, which is described in detail below:
First, vacuum winding coating. Vacuum winding coating is a technique of continuous coating on a flexible substrate using physical vapor deposition to complete some functional and decorative properties of the flexible substrate.
Second, sputter coating. Sputtered coating is under vacuum condition, high voltage is connected to the cathode to excite the glow discharge, positively charged argon ions hit the cathode to emit atoms, and the sputtered atoms are deposited on the substrate through lazy gas to form a film Floor.
3. Ion plating. It is developed on the basis of the above two vacuum coating skills, so it has both process characteristics. Under vacuum conditions, gas discharge is used to dissociate the working gas or the transpiration substance (film material), and under the ion bombardment, the transpiration or its reactants are deposited on the surface of the substrate. During the formation of the film, the substrate has been bombarded by particles with higher energy and is relatively clean.
All three are attributed to the use of physical vapor deposition skills (PVD).
This is followed by chemical vapor deposition (CVD). It uses a chemical reaction method to make a thin film. The principle is that at a set temperature, a reaction gas containing film-forming materials is passed to a substrate and adsorbed. A chemical reaction is performed on the substrate to form a core, and then the reaction product is released from the substrate The film surface is continuously dispersed to form a film. Beam deposition plating, an ion surface composite processing technique combining ion implantation and vapor deposition deposition techniques, is a technique that uses an ionized particle as a vapor deposition material to form an excellent film at a relatively low substrate temperature.